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SEMICONDUCTOR MANUFACTURING INDUSTRIES i. Toxic wastewater is generated due to presence of Hydrofluoric acid (HF), Mixed Nitric HF (HF + HNO3), Phosphoric acid, Sulphuric acid (H2SO4), Hydrogen Peroxide, Isopropyl alcohol (IPA) / Methanol (Methanol Only), Stripper EKC-265 /ACT N396 (ACT N396 Only), BHF – 63 U, Choline etchant, etc. ii. The air pollutants which are being emitted during the manufacturing process are SiH4, PH3, B2H6, HF, HBr, DCS, NF3, SF6, BCl3, Cl2, HCL, NH3, C2F6, CHF3, CF4, C4F8, C2F6 etc. iii. Process waste, used oil etc. are generated as hazardous waste.) (Compound semiconductors/ silicon photonics/ sensor fabs manufacturing)SEMICONDUCTOR MANUFACTURING INDUSTRIES i. Toxic wastewater is generated due to presence of Hydrofluoric acid (HF), Mixed Nitric HF (HF + HNO3), Phosphoric acid, Sulphuric acid (H2SO4), Hydrogen Peroxide, Isopropyl alcohol (IPA) / Methanol (Methanol Only), Stripper EKC-265 /ACT N396 (ACT N396 Only), BHF – 63 U, Choline etchant, etc. ii. The air p |
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